Photoresist Ancillary

Photoresist Ancillary Market Outlook

The global photoresist ancillary market is projected to reach approximately USD 3.1 billion by 2035, growing at a CAGR of around 6.3% during the forecast period from 2025 to 2035. The growth of this market can be attributed to the rapidly expanding semiconductor and electronics industries, which demand high-quality photoresist materials for advanced manufacturing processes. Additionally, the increasing trend of miniaturization in electronic devices is further pushing the need for efficient photoresist ancillary products. The rising adoption of advanced technologies like 5G and IoT across various sectors also plays a crucial role in enhancing the demand for photoresist solutions. Furthermore, the ongoing technological advancements aimed at improving the efficiency and effectiveness of photoresist materials are expected to provide additional growth opportunities in the market.

Growth Factor of the Market

The photoresist ancillary market is witnessing significant growth thanks to several key factors. First and foremost, the surge in demand for semiconductors, driven by the proliferation of digital technologies and the increasing usage of smart devices, is creating a substantial need for photoresist products. Moreover, advancements in photolithography techniques are enhancing the capabilities of photoresist materials, allowing manufacturers to produce smaller and more complex integrated circuits with greater precision. The rising trend of electric vehicles and renewable energy technologies is also driving the demand for specialized photoresist materials used in various applications such as solar cells and sensors. Additionally, the growing prevalence of automation in manufacturing processes is pushing companies to invest in high-performance photoresist solutions that can deliver superior results in a shortened production timeline. Lastly, increased research and development activities in nanotechnology and optoelectronics are anticipated to create new applications for photoresist ancillaries, further fuelling market growth.

Key Highlights of the Market

• Projected market size of USD 3.1 billion by 2035, reflecting strong market growth.
• Rapid expansion in semiconductor manufacturing is driving demand for photoresist materials.
• Technological advancements in photolithography are enhancing product capabilities.
• Adoption of electric vehicles and renewable technologies is increasing application areas.
• R&D activities in nanotechnology are expected to create new market opportunities.

By Product Type

Photoresist Developers:

Photoresist developers are essential chemicals used in the semiconductor manufacturing process, playing a crucial role in the development stage of photoresist materials. These developers help to remove unexposed photoresist during the lithography process, allowing for the precise etching of circuit patterns onto silicon wafers. The demand for advanced photoresist developers is increasing as the industry moves towards finer geometries in chip design, where high-performance developers must provide excellent resolution and contrast. Furthermore, the growing trend of miniaturization in electronics is amplifying the need for these products, as manufacturers seek to create smaller and more efficient devices without compromising on performance.

Photoresist Removers:

Photoresist removers are specialized formulations designed to effectively strip away photoresist materials from substrates after the etching process has been completed. The requirement for high-quality photoresist removers is rising due to the increasing complexity of semiconductor devices and the need for clean and residue-free surfaces. The effectiveness of these removers can directly impact yield rates in semiconductor fabrication, making them a vital component in the manufacturing process. Additionally, the enhancement of environmentally friendly formulations is becoming a significant trend in the market, as manufacturers aim to minimize their environmental footprint while maintaining efficiency in their production processes.

Photoresist Strippers:

Photoresist strippers are used to remove photoresist layers after patterning and etching processes in semiconductor fabrication. The effectiveness of photoresist strippers can significantly influence the overall efficiency of manufacturing operations. As semiconductor devices become more intricate, the demand for advanced strippers that can work under challenging conditions is growing. These products must be capable of removing resists quickly without damaging the underlying substrate, requiring continual innovation in formulation to match the evolving needs of the industry. Additionally, the focus on sustainability within the industry is prompting manufacturers to develop strippers that are less harmful to the environment while ensuring they meet stringent performance metrics.

Anti-Reflective Coatings:

Anti-reflective coatings are vital in semiconductor lithography, as they help to minimize reflection during exposure, thereby improving pattern fidelity and resolution. The increasing need for precision in semiconductor manufacturing is driving demand for high-performance anti-reflective coatings. These coatings allow for better light management during the photolithography process, enabling the production of finer features in chips. Furthermore, the trend towards advanced packaging technologies and the need for complex three-dimensional structures in semiconductor devices are further propelling the growth of this segment. The ability of anti-reflective coatings to enhance overall process yield makes them an indispensable component of the photoresist ancillary market.

Edge Bead Removers:

Edge bead removers are critical in the photolithography process for achieving uniform coating on substrates. They function to eliminate excess photoresist that accumulates on the edges of wafers during the spin-coating process. The growing complexity and miniaturization of semiconductor devices create an increasing demand for edge bead removers that can deliver precise and consistent results. These products are essential for ensuring optimal performance during the subsequent etching and development steps. As manufacturers strive for higher yields and improved efficiency, the edge bead remover segment is projected to experience significant growth driven by advancements in formulation chemistry and application techniques.

By Application

Semiconductor Industry:

The semiconductor industry is the primary application segment for photoresist ancillaries, encompassing a wide range of applications from wafer fabrication to packaging. The demand for photoresist materials in this segment is fueled by the increasing need for advanced semiconductor devices, particularly in the context of emerging technologies such as artificial intelligence, the Internet of Things (IoT), and 5G networks. As device complexity increases, the demand for state-of-the-art photoresist products that provide improved performance in terms of resolution and sensitivity is pivotal. Additionally, the relentless trend towards miniaturization necessitates innovative solutions that can keep pace with the evolving requirements of semiconductor manufacturing.

Electronics Industry:

In the electronics industry, photoresist ancillaries are used in the production of various components, including capacitors, resistors, and circuit boards. The ongoing digital transformation across multiple sectors is driving the growth of this application segment, as manufacturers seek to produce more compact and efficient electronic devices. With the rise of consumer electronics and smart devices, there is a corresponding increase in demand for advanced photoresist materials that can meet the rigorous performance standards expected in modern electronics. Additionally, the shift towards flexible and wearable electronics is creating new opportunities for specialized photoresist products designed to cater to these innovative applications.

Optoelectronics:

Optoelectronics represents another significant application area for photoresist ancillaries, encompassing devices that emit, detect, and manipulate light. This sector is experiencing rapid growth, driven by advancements in technologies such as LED lighting, fiber optics, and solar energy. The increasing adoption of optoelectronic devices in various applications, including telecommunications and renewable energy, is boosting the demand for high-performance photoresist materials tailored for optoelectronic fabrication processes. As the industry continues to evolve, there is a growing emphasis on developing photoresist products that can operate effectively under different wavelengths and offer enhanced stability and performance.

MEMS/NEMS:

Microelectromechanical systems (MEMS) and nanoelectromechanical systems (NEMS) are emerging fields that benefit significantly from photoresist ancillaries. These systems are integral to various applications, including sensors, actuators, and microfluidics. The demand for MEMS and NEMS devices is expanding due to their growing use in automotive, medical, and consumer electronics applications. High-quality photoresist materials are essential in the fabrication of these structures, as they enable the precise patterning required for small-scale components. The need for reliable and efficient photoresist solutions tailored to the unique challenges of MEMS/NEMS fabrication is driving growth in this application segment.

By Distribution Channel

Direct Sales:

Direct sales represent a significant distribution channel for photoresist ancillaries, enabling manufacturers to directly engage with customers and provide tailored solutions for their specific needs. This channel allows manufacturers to establish strong relationships with key clients, which can lead to repeat business and customer loyalty. Direct sales also facilitate the provision of technical support and consultation services, which are essential in the highly specialized field of semiconductor manufacturing. Furthermore, this channel enables manufacturers to gain valuable insights into customer requirements, helping them refine their product offerings and enhance their competitive edge in the market.

Distributors:

Distributors play a crucial role in the photoresist ancillary market by bridging the gap between manufacturers and end-users. They facilitate wider market reach by providing a diverse range of products to various customers, from small-scale manufacturers to large corporations. Distributors often have established networks and specialized knowledge of local markets, allowing them to cater effectively to the unique needs of their customer base. Additionally, distributors can help manufacturers manage inventory and logistics, ensuring that products are delivered promptly and efficiently. This distribution channel is particularly important for smaller manufacturers looking to penetrate new markets without establishing a direct sales force.

Online Retailers:

The rise of e-commerce has significantly impacted the distribution channels for photoresist ancillaries, with online retailers becoming an increasingly popular choice for purchasing these specialized materials. This channel offers convenience and flexibility for customers, allowing them to easily compare products, prices, and reviews. Online platforms also enable manufacturers to reach a broader audience, particularly smaller companies or startups that may not have access to traditional distribution channels. Additionally, the capacity for online retailers to provide detailed product information and support further enhances the purchasing experience for customers. As the trend toward digitization continues, the online retail channel is expected to grow, providing a valuable avenue for market expansion.

By Ingredient Type

Surfactants:

Surfactants are a key ingredient type in photoresist ancillaries, playing an essential role in enhancing the performance of photoresist materials. They help to improve wetting properties, enabling uniform coating of substrates during the application process. The demand for surfactants is driven by the increasing need for high-quality photoresist products that can meet the stringent requirements of advanced manufacturing processes. Additionally, surfactants can aid in the removal of photoresist residues, ensuring clean surfaces that are crucial for the success of subsequent fabrication steps. As manufacturers continue to push the boundaries of device performance, the importance of surfactants in photoresist formulations will remain significant.

Solvents:

Solvents are vital components in the formulation of photoresist ancillaries, serving as carriers for active ingredients and facilitating the application of photoresist materials. The choice of solvent can significantly influence the performance characteristics of a photoresist product, including its viscosity and drying time. The increasing complexity of semiconductor devices is driving the demand for specialized solvents that can enhance the efficiency of the photoresist application process. Moreover, environmental concerns are leading to the development of green solvent alternatives that offer reduced toxicity and environmental impact while maintaining performance efficacy. The solvent segment is, therefore, poised for continued growth as manufacturers seek to balance performance with sustainability.

Anti-foaming Agents:

Anti-foaming agents are crucial in the photoresist manufacturing process, as they help to control and eliminate foam formation during application. Foam can hinder the coating process and lead to defects in the final product, making anti-foaming agents essential for achieving high-quality results. The demand for these agents is growing in conjunction with the increased focus on improving manufacturing efficiency and product yield in semiconductor applications. Manufacturers are continually seeking innovative anti-foaming solutions that can effectively mitigate foam-related issues while remaining compatible with other formulation components. This trend is likely to contribute to the growth of the anti-foaming agents segment within the photoresist ancillary market.

Chelating Agents:

Chelating agents serve a pivotal role in photoresist formulations by binding to metal ions that can adversely affect the performance of photoresist materials. These agents help to stabilize formulations and enhance the overall quality of the photoresist application process. The increasing complexity of semiconductor fabrication processes, combined with the demand for higher performance and reliability, is driving the need for effective chelating agents in photoresist products. Additionally, as manufacturers strive to develop formulations that are less sensitive to environmental variations, the incorporation of chelating agents is becoming an important aspect of product development. As such, this ingredient type is expected to witness growth alongside the overall photoresist ancillary market.

pH Adjusters:

pH adjusters are essential in maintaining the optimal pH levels in photoresist formulations, which is crucial for achieving desired performance characteristics. The pH of a photoresist solution can significantly influence its coating properties, sensitivity, and overall effectiveness during the lithography process. As the industry moves towards more complex and specialized photoresist materials, the demand for effective pH adjusters that can deliver precise control over formulation characteristics is increasing. Furthermore, with ongoing efforts to improve the environmental compatibility of formulations, manufacturers are exploring green alternatives for pH adjustment, which is anticipated to boost the growth of this segment within the photoresist ancillary market.

By Region

The North American photoresist ancillary market is characterized by a robust demand driven primarily by the presence of leading semiconductor manufacturers and technological advancements in the region. The increasing investment in research and development activities, coupled with the rise of innovative applications in electronics and optoelectronics, is propelling market growth in this region. In 2023, North America's market share accounted for approximately 30% of the global photoresist ancillary market. This region is expected to witness a CAGR of around 5.5% over the forecast period, reflecting the ongoing advancements in semiconductor technology and the growing focus on miniaturization.

In Europe, the photoresist ancillary market is similarly expanding, fueled by strong demand from the semiconductor and electronics sectors. Europe accounted for approximately 25% of the global market share in 2023, with a growing emphasis on sustainability and the development of environmentally friendly photoresist formulations. The region's commitment to technological innovation is driving significant investments in semiconductor research, effectively contributing to market growth. The Asia Pacific region is anticipated to dominate the photoresist ancillary market, accounting for nearly 40% of the total share by 2023, owing to its booming electronics manufacturing industry and increasing semiconductor production capabilities. The region is projected to experience the highest CAGR of around 7.0% during the forecast period, as countries like China, Japan, and South Korea continue to expand their semiconductor manufacturing capacities.

Opportunities

The photoresist ancillary market is poised for significant growth opportunities driven by emerging technologies and the ongoing expansion of the semiconductor industry. As the demand for advanced electronic devices continues to rise, manufacturers are increasingly looking for innovative photoresist solutions that can enhance productivity and performance. This presents an opportunity for companies to develop specialized photoresist products that cater to the unique requirements of various applications, such as automotive electronics, IoT devices, and renewable energy technologies. Additionally, the ongoing advancements in photolithography techniques are opening new avenues for the development of high-precision photoresist materials that can meet the evolving challenges of semiconductor fabrication, thereby creating potential for market players to invest in R&D initiatives aimed at product innovation.

Furthermore, as sustainability becomes a key focus for manufacturers, there is a growing demand for eco-friendly photoresist formulations that minimize environmental impact. This shift towards green chemistry presents an opportunity for companies to differentiate themselves in the market by offering products that are both high-performing and environmentally responsible. Additionally, the increasing trend of mergers and acquisitions within the semiconductor supply chain may lead to collaborations that enhance the development and distribution of photoresist ancillaries. By leveraging strategic partnerships, companies can expand their reach into new markets and gain competitive advantage in the rapidly evolving landscape of semiconductor manufacturing.

Threats

Despite the growth prospects, the photoresist ancillary market also faces several threats that could impact its expansion. One significant challenge is the volatility in raw material prices, which can affect the production costs of photoresist materials. Fluctuations in the availability and pricing of key ingredients may lead to increased production costs, thereby impacting profit margins for manufacturers. Additionally, the highly competitive nature of the semiconductor industry means that market players must continually innovate to keep pace with rapidly changing technology and customer demands. Failure to do so may result in a loss of market share to more agile competitors that can better adapt to evolving trends.

Another potential threat to the market is the growing emphasis on automation and digitalization within semiconductor manufacturing. As manufacturers increasingly adopt automated processes, there may be a reduced need for certain photoresist ancillary products, potentially leading to decreased market demand. Furthermore, stringent environmental regulations concerning the use of chemicals in industrial processes may pose compliance challenges for manufacturers, necessitating investment in research and development to meet new standards. Companies that cannot effectively adapt to regulatory changes may face legal repercussions and reputational damage, which could hinder their growth prospects in the long term.

Competitor Outlook

• Tokyo Ohka Kogyo Co., Ltd. (TOK)
• Shin-Etsu Chemical Co., Ltd.
• Fujifilm Holdings Corporation
• Merck Group
• Samsung SDI Co., Ltd.
• Dow Chemical Company
• JSR Corporation
• Sumitomo Chemical Co., Ltd.
• BASF SE
• Henkel AG & Co. KGaA
• AZ Electronic Materials
• SUPERFINE Chemical
• Clariant AG
• Cymer, LLC (ASML Holding)
• MicroChem Corp.

The competitive landscape of the photoresist ancillary market is characterized by the presence of numerous established players and emerging companies striving to capture market share through product innovation and strategic collaboration. Major companies are investing heavily in research and development to develop advanced photoresist formulations that can meet the increasing demands of semiconductor manufacturing. This focus on innovation is leading to the introduction of specialized photoresist materials that are tailored for specific applications, thereby enhancing the competitive advantage of these companies. Additionally, partnerships and collaborations among industry players are becoming increasingly common, aimed at leveraging complementary strengths and expanding market reach.

Tokyo Ohka Kogyo Co., Ltd. (TOK) is one of the leading players in the photoresist ancillary market, known for its comprehensive portfolio of photoresist products and developers. The company has consistently focused on research and development to introduce innovative solutions that cater to the evolving needs of the semiconductor industry. Shin-Etsu Chemical Co., Ltd. is another key competitor with a strong presence in the global market, recognized for its high-performance photoresist materials and commitment to sustainability. The company has made significant investments in developing eco-friendly formulations that align with the growing trend towards green manufacturing.

Fujifilm Holdings Corporation is also a major player in the photoresist ancillary market, leveraging its expertise in imaging technology to develop advanced photoresist materials for semiconductor applications. The company has established a solid reputation for delivering high-quality products that meet stringent performance criteria. Merck Group, with its extensive experience in chemical solutions, offers a diverse range of photoresist ancillaries, focusing on addressing customer-specific requirements. Their commitment to innovation is evident through ongoing R&D efforts aimed at introducing next-generation photoresist solutions that enhance manufacturing efficiency and product performance.

• 1 Appendix

  • 1.1 List of Tables
  • 1.2 List of Figures

• 2 Introduction

  • 2.1 Market Definition
  • 2.2 Scope of the Report
  • 2.3 Study Assumptions
  • 2.4 Base Currency & Forecast Periods

• 3 Market Dynamics

  • 3.1 Market Growth Factors
  • 3.2 Economic & Global Events
  • 3.3 Innovation Trends
  • 3.4 Supply Chain Analysis

• 4 Consumer Behavior

  • 4.1 Market Trends
  • 4.2 Pricing Analysis
  • 4.3 Buyer Insights

• 5 Key Player Profiles

  • 5.1 BASF SE
    • 5.1.1 Business Overview
    • 5.1.2 Products & Services
    • 5.1.3 Financials
    • 5.1.4 Recent Developments
    • 5.1.5 SWOT Analysis
  • 5.2 Clariant AG
    • 5.2.1 Business Overview
    • 5.2.2 Products & Services
    • 5.2.3 Financials
    • 5.2.4 Recent Developments
    • 5.2.5 SWOT Analysis
  • 5.3 Merck Group
    • 5.3.1 Business Overview
    • 5.3.2 Products & Services
    • 5.3.3 Financials
    • 5.3.4 Recent Developments
    • 5.3.5 SWOT Analysis
  • 5.4 JSR Corporation
    • 5.4.1 Business Overview
    • 5.4.2 Products & Services
    • 5.4.3 Financials
    • 5.4.4 Recent Developments
    • 5.4.5 SWOT Analysis
  • 5.5 MicroChem Corp.
    • 5.5.1 Business Overview
    • 5.5.2 Products & Services
    • 5.5.3 Financials
    • 5.5.4 Recent Developments
    • 5.5.5 SWOT Analysis
  • 5.6 SUPERFINE Chemical
    • 5.6.1 Business Overview
    • 5.6.2 Products & Services
    • 5.6.3 Financials
    • 5.6.4 Recent Developments
    • 5.6.5 SWOT Analysis
  • 5.7 Dow Chemical Company
    • 5.7.1 Business Overview
    • 5.7.2 Products & Services
    • 5.7.3 Financials
    • 5.7.4 Recent Developments
    • 5.7.5 SWOT Analysis
  • 5.8 Henkel AG & Co. KGaA
    • 5.8.1 Business Overview
    • 5.8.2 Products & Services
    • 5.8.3 Financials
    • 5.8.4 Recent Developments
    • 5.8.5 SWOT Analysis
  • 5.9 Samsung SDI Co., Ltd.
    • 5.9.1 Business Overview
    • 5.9.2 Products & Services
    • 5.9.3 Financials
    • 5.9.4 Recent Developments
    • 5.9.5 SWOT Analysis
  • 5.10 AZ Electronic Materials
    • 5.10.1 Business Overview
    • 5.10.2 Products & Services
    • 5.10.3 Financials
    • 5.10.4 Recent Developments
    • 5.10.5 SWOT Analysis
  • 5.11 Cymer, LLC (ASML Holding)
    • 5.11.1 Business Overview
    • 5.11.2 Products & Services
    • 5.11.3 Financials
    • 5.11.4 Recent Developments
    • 5.11.5 SWOT Analysis
  • 5.12 Sumitomo Chemical Co., Ltd.
    • 5.12.1 Business Overview
    • 5.12.2 Products & Services
    • 5.12.3 Financials
    • 5.12.4 Recent Developments
    • 5.12.5 SWOT Analysis
  • 5.13 Shin-Etsu Chemical Co., Ltd.
    • 5.13.1 Business Overview
    • 5.13.2 Products & Services
    • 5.13.3 Financials
    • 5.13.4 Recent Developments
    • 5.13.5 SWOT Analysis
  • 5.14 Fujifilm Holdings Corporation
    • 5.14.1 Business Overview
    • 5.14.2 Products & Services
    • 5.14.3 Financials
    • 5.14.4 Recent Developments
    • 5.14.5 SWOT Analysis
  • 5.15 Tokyo Ohka Kogyo Co., Ltd. (TOK)
    • 5.15.1 Business Overview
    • 5.15.2 Products & Services
    • 5.15.3 Financials
    • 5.15.4 Recent Developments
    • 5.15.5 SWOT Analysis

• 6 Market Segmentation

  • 6.1 Photoresist Ancillary Market, By Application
    • 6.1.1 Semiconductor Industry
    • 6.1.2 Electronics Industry
    • 6.1.3 Optoelectronics
    • 6.1.4 MEMS/NEMS
  • 6.2 Photoresist Ancillary Market, By Product Type
    • 6.2.1 Photoresist Developers
    • 6.2.2 Photoresist Removers
    • 6.2.3 Photoresist Strippers
    • 6.2.4 Anti-Reflective Coatings
    • 6.2.5 Edge Bead Removers
  • 6.3 Photoresist Ancillary Market, By Ingredient Type
    • 6.3.1 Surfactants
    • 6.3.2 Solvents
    • 6.3.3 Anti-foaming Agents
    • 6.3.4 Chelating Agents
    • 6.3.5 pH Adjusters
  • 6.4 Photoresist Ancillary Market, By Distribution Channel
    • 6.4.1 Direct Sales
    • 6.4.2 Distributors
    • 6.4.3 Online Retailers

• 7 Competitive Analysis

  • 7.1 Key Player Comparison
  • 7.2 Market Share Analysis
  • 7.3 Investment Trends
  • 7.4 SWOT Analysis

• 8 Research Methodology

  • 8.1 Analysis Design
  • 8.2 Research Phases
  • 8.3 Study Timeline

• 9 Future Market Outlook

  • 9.1 Growth Forecast
  • 9.2 Market Evolution

• 10 Geographical Overview

  • 10.1 Europe - Market Analysis
    • 10.1.1 By Country
      • 10.1.1.1 UK
      • 10.1.1.2 France
      • 10.1.1.3 Germany
      • 10.1.1.4 Spain
      • 10.1.1.5 Italy
  • 10.2 Asia Pacific - Market Analysis
    • 10.2.1 By Country
      • 10.2.1.1 India
      • 10.2.1.2 China
      • 10.2.1.3 Japan
      • 10.2.1.4 South Korea
  • 10.3 Latin America - Market Analysis
    • 10.3.1 By Country
      • 10.3.1.1 Brazil
      • 10.3.1.2 Argentina
      • 10.3.1.3 Mexico
  • 10.4 North America - Market Analysis
    • 10.4.1 By Country
      • 10.4.1.1 USA
      • 10.4.1.2 Canada
  • 10.5 Middle East & Africa - Market Analysis
    • 10.5.1 By Country
      • 10.5.1.1 Middle East
      • 10.5.1.2 Africa
  • 10.6 Photoresist Ancillary Market by Region

• 11 Global Economic Factors

  • 11.1 Inflation Impact
  • 11.2 Trade Policies

• 12 Technology & Innovation

  • 12.1 Emerging Technologies
  • 12.2 AI & Digital Trends
  • 12.3 Patent Research

• 13 Investment & Market Growth

  • 13.1 Funding Trends
  • 13.2 Future Market Projections

• 14 Market Overview & Key Insights

  • 14.1 Executive Summary
  • 14.2 Key Trends
  • 14.3 Market Challenges
  • 14.4 Regulatory Landscape

Segments Analyzed in the Report

The global Photoresist Ancillary market is categorized based on

By Product Type

• Photoresist Developers
• Photoresist Removers
• Photoresist Strippers
• Anti-Reflective Coatings
• Edge Bead Removers

By Application

• Semiconductor Industry
• Electronics Industry
• Optoelectronics
• MEMS/NEMS

By Distribution Channel

• Direct Sales
• Distributors
• Online Retailers

By Ingredient Type

• Surfactants
• Solvents
• Anti-foaming Agents
• Chelating Agents
• pH Adjusters

By Region

• North America
• Europe
• Asia Pacific
• Latin America
• Middle East & Africa

Key Players

• Tokyo Ohka Kogyo Co., Ltd. (TOK)
• Shin-Etsu Chemical Co., Ltd.
• Fujifilm Holdings Corporation
• Merck Group
• Samsung SDI Co., Ltd.
• Dow Chemical Company
• JSR Corporation
• Sumitomo Chemical Co., Ltd.
• BASF SE
• Henkel AG & Co. KGaA
• AZ Electronic Materials
• SUPERFINE Chemical
• Clariant AG
• Cymer, LLC (ASML Holding)
• MicroChem Corp.