Extreme Ultraviolet EUV Photoresist

Extreme Ultraviolet (EUV) Photoresist Market Outlook

The global extreme ultraviolet (EUV) photoresist market is anticipated to reach approximately USD 2.5 billion by 2035, growing at a compound annual growth rate (CAGR) of about 12.6% from 2025 to 2035. This expansion is primarily driven by the increasing demand for advanced semiconductor manufacturing processes, where EUV lithography plays a critical role in producing smaller and more efficient microchips. The surge in consumer electronics along with the proliferation of IoT devices is also propelling the demand for ICs, thus contributing to the market's growth. Furthermore, the technological advancements in EUV lithography systems and the need for denser semiconductor structures are likely to enhance the adoption of EUV photoresists. As manufacturers aim for higher yields and lower defect rates, the transition to EUV technology is seen as essential for maintaining competitiveness in the semiconductor industry.

Growth Factor of the Market

The growth of the EUV photoresist market is significantly influenced by the ongoing advancements in semiconductor technology, particularly the shift towards smaller technology nodes, which are essential for enhancing performance while reducing power consumption. The push for more efficient and compact electronic devices is fostering innovations in lithography, where EUV technology stands out due to its ability to produce intricate patterns at a nanometer scale. Moreover, the growing investments from leading semiconductor manufacturers such as TSMC and Samsung in EUV lithography equipment are driving the demand for high-quality photoresists. The increasing complexity of semiconductor devices necessitates the use of specialized materials that can withstand the rigorous demands of EUV exposure, further elevating the market prospects. Additionally, the rise of artificial intelligence, machine learning, and the expansion of 5G networks are amplifying the need for advanced semiconductor components, solidifying the market's growth trajectory.

Key Highlights of the Market

• The EUV photoresist market is projected to grow at a CAGR of 12.6% between 2025 and 2035.
• Technological advancements in semiconductor manufacturing technologies are a key driver for market growth.
• Asia Pacific is expected to dominate the market due to the presence of major semiconductor manufacturers.
• Chemically Amplified Photoresists are anticipated to hold the largest market share by product type.
• Rising demand for high-performance chips in consumer electronics is boosting the EUV photoresist market.

By Product Type

Chemically Amplified Photoresists:

Chemically amplified photoresists are a vital segment of the EUV photoresist market, known for their enhanced sensitivity and resolution capabilities. These photoresists contain a chemical amplifier that increases the photoactive compound's response to EUV light, allowing for the development of finer patterns required in state-of-the-art semiconductor devices. The increasing demand for chips with more transistors packed into a smaller area is driving the consumption of chemically amplified photoresists, as they can effectively address the challenges associated with the fabrication of advanced nodes below 5 nanometers. Moreover, advancements in the formulation of these photoresists are improving their performance in terms of resolution and line edge roughness, thereby enhancing their adoption in high-volume manufacturing environments.

Metal Oxide Photoresists:

Metal oxide photoresists are gaining traction in the EUV photoresist market owing to their unique properties that allow for better patterning of metal layers in semiconductor devices. These photoresists offer advantages such as high thermal stability and chemical resistance, making them ideal for applications requiring stringent processing conditions. Their ability to form high-quality patterns with minimized defects is crucial for the production of advanced semiconductor devices. As the semiconductor industry continues to pursue higher performance and energy-efficient solutions, metal oxide photoresists are expected to witness increased adoption, especially in applications where traditional photoresists may fall short. The growing integration of metal layers in semiconductor fabrication is further propelling the demand for this type of photoresist.

Non-Chemically Amplified Photoresists:

Non-chemically amplified photoresists are used in specific applications within the EUV photoresist market, particularly where maximum resolution and pattern fidelity are required. Unlike their chemically amplified counterparts, these photoresists do not rely on chemical amplification processes, which can sometimes introduce variability in patterning. This makes them suitable for applications seeking high precision and reliability. The increasing requirement for robust materials that can handle the complexities of modern semiconductor manufacturing is likely to boost the market for non-chemically amplified photoresists. Furthermore, advancements in formulation chemistry are enhancing their performance characteristics, thereby making them a viable option for various critical applications within the semiconductor industry.

Inorganic Photoresists:

Inorganic photoresists are emerging as an innovative segment within the EUV photoresist market, characterized by their stability and resistance to high temperatures and radiation. These materials are being developed to address the limitations of traditional organic photoresists, particularly in terms of durability and environmental sustainability. Inorganic photoresists can provide higher resolution and improved processing performance, making them attractive for next-generation semiconductor manufacturing. As semiconductor devices evolve and the demand for more robust materials increases, inorganic photoresists are expected to carve out a significant share of the market. Their development aligns with the industry's focus on sustainability and reducing the environmental impact of semiconductor fabrication processes.

Others:

This segment encompasses various niche photoresist materials that do not fall into the previously mentioned categories. These includes specialized formulations designed for unique applications or specific processing conditions. The diversity within this segment allows manufacturers to tailor photoresist properties to meet particular requirements, such as enhanced adhesion or improved pattern transfer capabilities. As the semiconductor industry continues to innovate and develop new applications, the demand for these specialized photoresists is expected to grow, providing opportunities for manufacturers to differentiate their product offerings and cater to specific market needs.

By Application

Semiconductor Manufacturing:

Semiconductor manufacturing is the largest application segment for EUV photoresists, accounting for a substantial portion of the overall market. The escalating demand for advanced semiconductor devices, driven by the proliferation of technologies such as AI, IoT, and 5G, is fueling the need for high-performance photoresists in chip fabrication. EUV lithography enables manufacturers to produce intricate microstructures that are critical for enhancing the performance and efficiency of semiconductor devices. The shift towards smaller technology nodes, particularly below 5nm, necessitates the use of EUV photoresists to achieve the required resolution and pattern fidelity. As semiconductor manufacturers continue to invest heavily in cutting-edge technology, the demand for EUV photoresists is expected to remain robust in this domain.

Flat Panel Display Manufacturing:

The flat panel display manufacturing segment is witnessing increased adoption of EUV photoresists due to the trend of producing high-resolution displays with improved color accuracy and energy efficiency. With the growing consumer electronics market and the rise of large-screen televisions and smartphones, the demand for advanced display technologies is surging. EUV photoresists facilitate the precise patterning required in the manufacturing of OLED and LCD screens, allowing for finer pixel arrangements and better overall display quality. The continuous advancements in display technologies are likely to enhance the market for EUV photoresists, as manufacturers seek to leverage EUV lithography for superior performance in flat panel displays.

Micro-electromechanical Systems (MEMS):

The MEMS application segment presents a significant opportunity for the EUV photoresist market, as these miniature devices require precise manufacturing techniques to ensure their performance and reliability. MEMS technology is increasingly utilized across various industries, including automotive, healthcare, and consumer electronics, driving the demand for advanced fabrication processes. EUV photoresists allow for the intricate patterning required for MEMS devices, enabling manufacturers to produce complex structures with high dimensional accuracy. As the market for MEMS continues to expand, the reliance on EUV lithography and photoresists is expected to grow, further propelling the overall EUV photoresist market.

Others:

This category includes various applications that utilize EUV photoresists beyond the primary sectors mentioned above. Areas such as optical devices, sensors, and advanced packaging technologies are increasingly incorporating EUV lithography in their manufacturing processes. As industries seek to innovate and create new functionalities in their products, the demand for specialized EUV photoresists tailored for these unique applications is likely to increase. The versatility of EUV lithography and the ability to produce intricate features are drawing attention from numerous sectors, leading to growth in this segment of the photoresist market.

By Distribution Channel

Direct Sales:

Direct sales are a prominent distribution channel within the EUV photoresist market, allowing manufacturers to engage directly with their customers and offer tailored solutions. This approach enables suppliers to establish strong relationships with semiconductor manufacturers, understand their specific needs, and provide customized photoresist formulations that cater to advanced semiconductor processes. The direct sales model also facilitates efficient communication regarding product specifications, performance metrics, and technical support, ensuring that clients receive the most appropriate products for their applications. As the demand for specialized EUV photoresists continues to rise, direct sales channels are expected to gain further prominence in the market.

Distributor:

Distributors play a crucial role in the EUV photoresist market by providing a wide range of products to various semiconductor manufacturers and research institutions. They serve as intermediaries that facilitate the distribution of photoresists from manufacturers to end-users, often carrying multiple brands and product lines to meet diverse customer needs. Distributors are beneficial in expanding market reach and providing local support, which is especially important for smaller manufacturers and emerging markets. Their established networks and distribution capabilities aid in the effective delivery of EUV photoresists, thereby supporting the growing demand in the semiconductor industry.

By Ingredient Type

Photosensitive Compounds:

Photosensitive compounds constitute a major segment of the ingredient type category in the EUV photoresist market, serving as the primary active materials that undergo a chemical reaction when exposed to EUV light. These compounds are critical for achieving the desired resolution and sensitivity in photoresist formulations, enabling the production of intricate microstructures. The continuous innovation in photosensitive compounds, with a focus on improving performance metrics such as contrast and development speed, is crucial for meeting the demands of advanced semiconductor manufacturing processes. As the technology evolves, manufacturers are investing in research and development to create new and improved photosensitive compounds, further bolstering their significance in the market.

Solvents:

Solvents are essential components in the formulation of EUV photoresists, playing a vital role in the dilution and application process. They help in achieving the desired viscosity and flow characteristics required for uniform coating on substrates. The selection of appropriate solvents impacts the performance of the photoresist, including its adhesion properties and ease of development. As the market for EUV photoresists expands, the demand for high-quality solvents that can enhance the performance of photoresists in various applications is also on the rise. Manufacturers are focusing on optimizing solvent compositions to improve the overall efficiency and effectiveness of photoresist formulations.

Additives:

Additives are incorporated into EUV photoresist formulations to enhance various properties such as stability, adhesion, and performance during the lithography process. These substances are designed to optimize the functionality of the photoresist and improve its resistance to environmental factors. The integration of advanced additives is becoming more prevalent as manufacturers seek to develop photoresists that can withstand the rigorous demands of modern semiconductor fabrication. As the complexity of semiconductor devices increases, the role of additives in EUV photoresists becomes critical in delivering reliable performance and achieving higher yields in manufacturing processes.

Others:

This segment includes various other ingredient types that do not fall under the conventional categories of photosensitive compounds, solvents, or additives. These may encompass experimental materials or specialized formulations designed for unique applications within the EUV photoresist market. The diversity within this category reflects the ongoing innovation and research aimed at developing more effective and efficient photoresist systems. As the semiconductor industry continues to evolve, the exploration of alternative materials and new ingredient types is likely to support the advancement of EUV lithography techniques.

By Region

The EUV photoresist market is expected to witness substantial growth across various regions, with Asia Pacific emerging as the dominant player due to the presence of leading semiconductor manufacturers such as TSMC, Samsung, and Intel. This region is projected to capture over 40% of the market share by 2035, fueled by the increasing demand for high-performance semiconductor devices and the ongoing transition towards advanced manufacturing technologies. Furthermore, government initiatives and investments in semiconductor fabs are driving the growth of the EUV photoresist market in Asia Pacific, with a CAGR of around 13.5% anticipated during the forecast period. The robust R&D activities in this region are also contributing to the advancement of EUV lithography processes, further bolstering market prospects.

North America and Europe are also important regions for the EUV photoresist market, collectively accounting for more than 30% of the market share by 2035. In North America, the presence of established semiconductor manufacturers and research institutions is driving the demand for advanced photoresist technologies. The market in this region is expected to grow at a CAGR of approximately 11.8%, as companies seek to enhance production efficiencies and meet the evolving requirements of the semiconductor landscape. Meanwhile, Europe is focusing on strengthening its semiconductor manufacturing capabilities and fostering innovation, which will further support the growth of the EUV photoresist market. As these regions invest in next-generation technologies, the demand for EUV photoresists is likely to remain strong.

Opportunities

The EUV photoresist market is poised to capitalize on several emerging opportunities driven by technological advancements and industry trends. One of the most significant opportunities lies in the continuous advancement of semiconductor technology, which is pushing the boundaries of miniaturization and performance enhancement. The demand for smaller, faster, and more efficient semiconductor devices is ever-increasing, and EUV lithography is positioned as a key enabler of this evolution. Moreover, the expanding market for consumer electronics, including smartphones, tablets, and wearables, is creating a robust demand for advanced semiconductor components, thus fostering opportunities for the EUV photoresist market. As manufacturers strive to keep pace with technological advancements and consumer expectations, the adoption of EUV photoresists is expected to accelerate, providing growth avenues for market participants.

Another notable opportunity in the EUV photoresist market stems from the increasing investments being made by semiconductor manufacturers in R&D and capacity expansion. This trend is particularly pronounced among leading companies that are focused on developing cutting-edge manufacturing processes. As these manufacturers adopt EUV lithography for next-generation nodes, they will require high-performance photoresists to meet their production needs. Additionally, the growing emphasis on sustainability and environmentally friendly manufacturing practices is prompting the development of eco-friendly photoresist formulations, which can open new markets and attract environmentally-conscious consumers. By aligning product offerings with these evolving trends, EUV photoresist manufacturers can capitalize on burgeoning opportunities and enhance their market positioning.

Threats

The EUV photoresist market faces certain threats that could potentially hinder its growth trajectory. One of the primary challenges is the high cost associated with EUV lithography equipment and the corresponding photoresists, which can pose a barrier for smaller manufacturers and emerging markets. The significant investment required for the development and implementation of EUV technologies may limit the number of players in the market, thereby affecting competition and innovation. Additionally, the market is susceptible to fluctuations in the semiconductor industry, which is characterized by cycles of boom and bust. Economic downturns or changes in consumer demand can impact semiconductor manufacturing, consequently affecting the demand for EUV photoresists. Lastly, rapid technological advancements may lead to the emergence of alternative lithography techniques that may compete with EUV lithography, further posing threats to market sustainability.

In addition to the aforementioned threats, regulatory challenges and compliance requirements can also restrain the growth of the EUV photoresist market. The semiconductor industry is subject to stringent regulations concerning environmental impact and safety standards, which may complicate the development and commercialization of new photoresist formulations. Manufacturers may face challenges in meeting these regulatory requirements, leading to increased costs and extended timeframes for product development. Furthermore, the global supply chain disruptions, particularly in light of recent geopolitical tensions and the COVID-19 pandemic, can impact the availability of raw materials needed for photoresist production. These factors collectively present significant restraints that can affect the overall growth and stability of the EUV photoresist market.

Competitor Outlook

• Tokyo Ohka Kogyo Co., Ltd.
• Shin-Etsu Chemical Co., Ltd.
• Merck Group
• Sumitomo Chemical Co., Ltd.
• JSR Corporation
• Dow Chemical Company
• Fujifilm Corporation
• BASF SE
• Eastman Chemical Company
• SABIC
• Wacker Chemie AG
• Allresist GmbH
• Henkel AG & Co. KGaA
• Microchemicals GmbH
• Shenzhen Huafeng New Materials Co., Ltd.

The competitive landscape of the EUV photoresist market is characterized by the presence of several key players who are engaged in extensive research and development activities to enhance their product offerings and gain a competitive edge. Major companies such as Tokyo Ohka Kogyo Co., Ltd. and Shin-Etsu Chemical Co., Ltd. are leading the market with their innovative photoresist solutions tailored for advanced semiconductor manufacturing processes. These companies invest heavily in R&D to develop next-generation photoresists that can meet the demands of emerging technologies while ensuring high performance and reliability. Additionally, strategic partnerships and collaborations between key players and semiconductor manufacturers are common, allowing for the co-development of advanced materials and technologies, which creates a more dynamic and competitive market environment.

Merck Group and Sumitomo Chemical Co., Ltd. are also notable competitors in the EUV photoresist market, focusing on expanding their product portfolios and increasing market penetration. These companies leverage their expertise in chemical manufacturing to develop high-quality photoresists that meet the stringent requirements of semiconductor fabrication. Furthermore, with the growing emphasis on sustainability and eco-friendly solutions, these companies are exploring the development of green photoresist formulations, which can not only enhance their product appeal but also align with industry trends towards environmentally conscious manufacturing practices. Their commitment to innovation positions them well in the competitive landscape, enabling them to cater to a diverse clientele across various applications.

Other significant players in the EUV photoresist market include JSR Corporation, Dow Chemical Company, and Fujifilm Corporation, all of which are actively working to enhance their competitive positions through product innovation and strategic expansion. JSR Corporation is recognized for its advanced photoresist technology, which is essential for high-resolution lithography processes. Dow Chemical Company, on the other hand, focuses on integrating advanced materials into its offerings, ensuring that its photoresists are compatible with evolving semiconductor technologies. Meanwhile, Fujifilm Corporation is capitalizing on its extensive experience in the imaging and chemical sectors to develop innovative solutions for the semiconductor industry. As these companies continue to push the boundaries of technology, the competitive dynamics of the EUV photoresist market are likely to evolve, leading to new opportunities and challenges for market participants.

• 1 Appendix

  • 1.1 List of Tables
  • 1.2 List of Figures

• 2 Introduction

  • 2.1 Market Definition
  • 2.2 Scope of the Report
  • 2.3 Study Assumptions
  • 2.4 Base Currency & Forecast Periods

• 3 Market Dynamics

  • 3.1 Market Growth Factors
  • 3.2 Economic & Global Events
  • 3.3 Innovation Trends
  • 3.4 Supply Chain Analysis

• 4 Consumer Behavior

  • 4.1 Market Trends
  • 4.2 Pricing Analysis
  • 4.3 Buyer Insights

• 5 Key Player Profiles

  • 5.1 SABIC
    • 5.1.1 Business Overview
    • 5.1.2 Products & Services
    • 5.1.3 Financials
    • 5.1.4 Recent Developments
    • 5.1.5 SWOT Analysis
  • 5.2 BASF SE
    • 5.2.1 Business Overview
    • 5.2.2 Products & Services
    • 5.2.3 Financials
    • 5.2.4 Recent Developments
    • 5.2.5 SWOT Analysis
  • 5.3 Merck Group
    • 5.3.1 Business Overview
    • 5.3.2 Products & Services
    • 5.3.3 Financials
    • 5.3.4 Recent Developments
    • 5.3.5 SWOT Analysis
  • 5.4 Allresist GmbH
    • 5.4.1 Business Overview
    • 5.4.2 Products & Services
    • 5.4.3 Financials
    • 5.4.4 Recent Developments
    • 5.4.5 SWOT Analysis
  • 5.5 JSR Corporation
    • 5.5.1 Business Overview
    • 5.5.2 Products & Services
    • 5.5.3 Financials
    • 5.5.4 Recent Developments
    • 5.5.5 SWOT Analysis
  • 5.6 Wacker Chemie AG
    • 5.6.1 Business Overview
    • 5.6.2 Products & Services
    • 5.6.3 Financials
    • 5.6.4 Recent Developments
    • 5.6.5 SWOT Analysis
  • 5.7 Microchemicals GmbH
    • 5.7.1 Business Overview
    • 5.7.2 Products & Services
    • 5.7.3 Financials
    • 5.7.4 Recent Developments
    • 5.7.5 SWOT Analysis
  • 5.8 Dow Chemical Company
    • 5.8.1 Business Overview
    • 5.8.2 Products & Services
    • 5.8.3 Financials
    • 5.8.4 Recent Developments
    • 5.8.5 SWOT Analysis
  • 5.9 Fujifilm Corporation
    • 5.9.1 Business Overview
    • 5.9.2 Products & Services
    • 5.9.3 Financials
    • 5.9.4 Recent Developments
    • 5.9.5 SWOT Analysis
  • 5.10 Henkel AG & Co. KGaA
    • 5.10.1 Business Overview
    • 5.10.2 Products & Services
    • 5.10.3 Financials
    • 5.10.4 Recent Developments
    • 5.10.5 SWOT Analysis
  • 5.11 Eastman Chemical Company
    • 5.11.1 Business Overview
    • 5.11.2 Products & Services
    • 5.11.3 Financials
    • 5.11.4 Recent Developments
    • 5.11.5 SWOT Analysis
  • 5.12 Tokyo Ohka Kogyo Co., Ltd.
    • 5.12.1 Business Overview
    • 5.12.2 Products & Services
    • 5.12.3 Financials
    • 5.12.4 Recent Developments
    • 5.12.5 SWOT Analysis
  • 5.13 Sumitomo Chemical Co., Ltd.
    • 5.13.1 Business Overview
    • 5.13.2 Products & Services
    • 5.13.3 Financials
    • 5.13.4 Recent Developments
    • 5.13.5 SWOT Analysis
  • 5.14 Shin-Etsu Chemical Co., Ltd.
    • 5.14.1 Business Overview
    • 5.14.2 Products & Services
    • 5.14.3 Financials
    • 5.14.4 Recent Developments
    • 5.14.5 SWOT Analysis
  • 5.15 Shenzhen Huafeng New Materials Co., Ltd.
    • 5.15.1 Business Overview
    • 5.15.2 Products & Services
    • 5.15.3 Financials
    • 5.15.4 Recent Developments
    • 5.15.5 SWOT Analysis

• 6 Market Segmentation

  • 6.1 Extreme Ultraviolet EUV Photoresist Market, By Application
    • 6.1.1 Semiconductor Manufacturing
    • 6.1.2 Flat Panel Display Manufacturing
    • 6.1.3 Micro-electromechanical Systems (MEMS)
    • 6.1.4 Others
  • 6.2 Extreme Ultraviolet EUV Photoresist Market, By Product Type
    • 6.2.1 Chemically Amplified Photoresists
    • 6.2.2 Metal Oxide Photoresists
    • 6.2.3 Non-Chemically Amplified Photoresists
    • 6.2.4 Inorganic Photoresists
    • 6.2.5 Others
  • 6.3 Extreme Ultraviolet EUV Photoresist Market, By Ingredient Type
    • 6.3.1 Photosensitive Compounds
    • 6.3.2 Solvents
    • 6.3.3 Additives
    • 6.3.4 Others
  • 6.4 Extreme Ultraviolet EUV Photoresist Market, By Distribution Channel
    • 6.4.1 Direct Sales
    • 6.4.2 Distributor

• 7 Competitive Analysis

  • 7.1 Key Player Comparison
  • 7.2 Market Share Analysis
  • 7.3 Investment Trends
  • 7.4 SWOT Analysis

• 8 Research Methodology

  • 8.1 Analysis Design
  • 8.2 Research Phases
  • 8.3 Study Timeline

• 9 Future Market Outlook

  • 9.1 Growth Forecast
  • 9.2 Market Evolution

• 10 Geographical Overview

  • 10.1 Europe - Market Analysis
    • 10.1.1 By Country
      • 10.1.1.1 UK
      • 10.1.1.2 France
      • 10.1.1.3 Germany
      • 10.1.1.4 Spain
      • 10.1.1.5 Italy
  • 10.2 Asia Pacific - Market Analysis
    • 10.2.1 By Country
      • 10.2.1.1 India
      • 10.2.1.2 China
      • 10.2.1.3 Japan
      • 10.2.1.4 South Korea
  • 10.3 Latin America - Market Analysis
    • 10.3.1 By Country
      • 10.3.1.1 Brazil
      • 10.3.1.2 Argentina
      • 10.3.1.3 Mexico
  • 10.4 North America - Market Analysis
    • 10.4.1 By Country
      • 10.4.1.1 USA
      • 10.4.1.2 Canada
  • 10.5 Middle East & Africa - Market Analysis
    • 10.5.1 By Country
      • 10.5.1.1 Middle East
      • 10.5.1.2 Africa
  • 10.6 Extreme Ultraviolet EUV Photoresist Market by Region

• 11 Global Economic Factors

  • 11.1 Inflation Impact
  • 11.2 Trade Policies

• 12 Technology & Innovation

  • 12.1 Emerging Technologies
  • 12.2 AI & Digital Trends
  • 12.3 Patent Research

• 13 Investment & Market Growth

  • 13.1 Funding Trends
  • 13.2 Future Market Projections

• 14 Market Overview & Key Insights

  • 14.1 Executive Summary
  • 14.2 Key Trends
  • 14.3 Market Challenges
  • 14.4 Regulatory Landscape

Segments Analyzed in the Report

The global Extreme Ultraviolet EUV Photoresist market is categorized based on

By Product Type

• Chemically Amplified Photoresists
• Metal Oxide Photoresists
• Non-Chemically Amplified Photoresists
• Inorganic Photoresists
• Others

By Application

• Semiconductor Manufacturing
• Flat Panel Display Manufacturing
• Micro-electromechanical Systems (MEMS)
• Others

By Distribution Channel

• Direct Sales
• Distributor

By Ingredient Type

• Photosensitive Compounds
• Solvents
• Additives
• Others

By Region

• North America
• Europe
• Asia Pacific
• Latin America
• Middle East & Africa

Key Players

• Tokyo Ohka Kogyo Co., Ltd.
• Shin-Etsu Chemical Co., Ltd.
• Merck Group
• Sumitomo Chemical Co., Ltd.
• JSR Corporation
• Dow Chemical Company
• Fujifilm Corporation
• BASF SE
• Eastman Chemical Company
• SABIC
• Wacker Chemie AG
• Allresist GmbH
• Henkel AG & Co. KGaA
• Microchemicals GmbH
• Shenzhen Huafeng New Materials Co., Ltd.